Please use this identifier to cite or link to this item: http://dspace.aiub.edu:8080/jspui/handle/123456789/2719
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dc.contributor.authorIqfath, Mohammad Musfeq-
dc.contributor.authorMahmud, Sakib-
dc.contributor.authorNishat, Maksuraton-
dc.contributor.authorChowdhury, Fariya-
dc.contributor.authorHaque, Md. Ehasanul-
dc.date.accessioned2025-05-19T04:43:38Z-
dc.date.available2025-05-19T04:43:38Z-
dc.date.issued2022-01-24-
dc.identifier.urihttp://dspace.aiub.edu:8080/jspui/handle/123456789/2719-
dc.language.isoenen_US
dc.titleThin film deposition of Au on the TiO2 substrate by physical vapor deposition (PVD) techniqueen_US
dc.typeArticleen_US
Appears in Collections:Publications From Faculty of Engineering

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