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dc.contributor.authorBhuyan, Muhibul Haque-
dc.contributor.authorKhosru, Quazi Deen Mohd-
dc.date.accessioned2022-05-16T09:49:21Z-
dc.date.available2022-05-16T09:49:21Z-
dc.date.issued2012-12-31-
dc.identifier.citationM. H. Bhuyan and Q. D. M. Khosru, “A Semi-Analytical Subthreshold Drain Current Deflection Model for the Asymmetric Pocket Implanted Nano Scale n-MOSFET,” Journal of Electrical Engineering, the Institution of Engineers Bangladesh (IEB-EE), ISSN: p-0379-4318, vol. EE 38, no. II, Dec. 2012, pp. 9-15.en_US
dc.identifier.issnp-0379-4318-
dc.identifier.urihttp://dspace.aiub.edu:8080/jspui/handle/123456789/555-
dc.descriptionThis is joint research work.en_US
dc.description.abstractThis paper introduces the effect of the magnetic field on the subthreshold drain current of pocket implanted n-MOSFET. The pocket implanted n-MOSFET’s surface potential, threshold voltage, electron mobility, and subthreshold drain current models are used to study the effect of the magnetic field on the drain current deflection in the inversion channel. Magnetic field strength is varied from ±200 mT to ±250 mT. Results verify the theoretical derivations This model can be used if short channel n-MOSFETs are used to develop the Magnetic FET Sensor (MFS). This type of sensor has many practical applications.en_US
dc.description.sponsorshipSelf-fundeden_US
dc.language.isoen_USen_US
dc.publisherThe Institution of Engineers Bangladesh (IEB-EE)en_US
dc.relation.ispartofseries;2-
dc.subjectPocket implanted n-MOSFETen_US
dc.subjectDrain Current Deflectionen_US
dc.subjectMagnetic FET Sensoren_US
dc.subjectMagnetic Fielden_US
dc.titleA Semi-Analytical Subthreshold Drain Current Deflection Model for the Asymmetric Pocket Implanted Nano Scale n-MOSFETen_US
dc.typeArticleen_US
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