Please use this identifier to cite or link to this item: http://dspace.aiub.edu:8080/jspui/handle/123456789/722
Title: Temperature Effects on Subthreshold Drain Current of Nano Scale Pocket Implanted n-MOSFET
Authors: Bhuyan, Muhibul Haque
Ferdous, Fouzia
Khosru, Quazi Deen Mohd
Keywords: Pocket implanted MOS device
nano scaled n-MOSFET
Temperature Effects
Drain Current
Threshold voltage
Simulation
Issue Date: 7-Mar-2013
Citation: M. H. Bhuyan, F. Ferdous, and Q. D. M. Khosru, “Temperature Effects on Subthreshold Drain Current of Nano Scale Pocket Implanted n-MOSFET,” Proceedings of the International Conference on Electrical and Computer Engineering (ICECE), Dhaka, 20-22 December 2012, pp. 599-602.
Abstract: Temperature fluctuations affect threshold voltage, carrier mobility and transit time of an n-MOSFET. This phenomenon induces the variations of drain current in the device. This paper presents an analytical model of the temperature effects of subthreshold drain current of pocket implanted n-MOSFET. The model has also been used to study the device behavior at low and high ambient temperatures. The model includes the effects of temperature on the threshold voltage, the carrier mobility and hence on the subthreshold drain current for nano scale pocket implanted n-MOSFET.
URI: http://dspace.aiub.edu:8080/jspui/handle/123456789/722
Appears in Collections:Publications From Faculty of Engineering

Files in This Item:
File Description SizeFormat 
Draft_DSpace_Publication_Info_Upload_FE_Prof Muhibul IEEE ICECE Id_T.docx3.33 MBMicrosoft Word XMLView/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.